15 years extreme lithography!


For fifteen years now, xlith offers an industry-first direct wafer electron beam writing service relying on an excellent e-beam tool set. Our activity is based on more than 30 years of experience in this field.
We will never stop to push technology further.

 

Application Overview –
We are inside your favourite devices

Xlith offers a wide range of direct e-beam applications, having the experience and appropriate production facilities for your most demanding specifications.

 

The main advantages of direct
e-beam writing @ xlith:

  • High Resolution
  • Pattern Fidelity
  • Overlay to existing technology levels
  • Fast Prototyping without need for mask production
 

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