More than 20 years extreme lithography!

For over twenty years now, xlith offers an industry-first direct wafer electron beam writing service relying on an excellent e-beam tool set. Our activity is based on more than 35 years of experience in this field.
We will never stop to push technology further.

Application Overview –
We are inside your favourite devices

Xlith offers a wide range of direct e-beam applications, having the experience and appropriate production facilities for your most demanding specifications.

The main advantages of direct
e-beam writing @ xlith:

• High Resolution
• Pattern Fidelity
• Overlay to existing technology levels
• Fast Prototyping without need for mask production

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