Advanced microelectronics, photonics, nanotechnology – they all rely on high resolution electron beam lithography as the primary source for ultra-fine lateral patterns, generated directly on a functional substrate.
Electron beam lithography is a computer controlled sequential writing process. It transfers designs from CAD layout description to physical object. It uniquely combines ultra-high resolution, overlay performance and direct, computer driven pattern generation.
xlith offers an industry-first direct write electron beam lithography service with more than 30 years experience in this area.
To achieve outstanding results we combine
- state-of-the-art electron beam equipment, additionally fine-tuned for optimum performance
- thorough theoretical understanding
- in-house developed simulation, correction and transcription tools
- proprietary process technologies
Electron beam lithography is our focus and our passion. We have a thorough understanding of the underlying physics, the required instrumentation and the associated process technology. In short:
we know how to write nanometer®