In Nano Imprint Lithography (NIL), a template with nanometer features is pressed into a resist cast, creating a thickness modulation.
Hot embossing and injection molding are two prominent variants of this technology. A third variant uses transparent templates and low viscosity, UV-curable monomeric resists.
xlith fabricates templates for Nano Imprint Lithography based on Si and Quartz / Fused Silica substrates.
Soft lithography methods utilize elastomeric stamps, replicated from a nanopatterned master substrate. xlith fabricates high resolution soft lithography masters based on SOI substrates.